ASML (ASML) researchers said they have boosted the power of light source in its extreme ultraviolet lithography machines to 1,000 watts from 600 watts, Reuters reported Monday.

The discovery could enable chipmakers to produce up to 50% more chips by the end of the decade, the report said.

The more powerful light source is expected to allow shorter exposure times when printing chips, increasing production and lowering per-chip costs, according to the report.

Customers could process about 330 silicon wafers per hour on each EUV machine by 2030, up from roughly 220 currently, Reuters reported.

Shares of ASML were up over 1% in recent Monday trading.

(Market Chatter news is derived from conversations with market professionals globally. This information is believed to be from reliable sources but may include rumor and speculation. Accuracy is not guaranteed.)

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