韩国简化极紫外光刻机进口审批流程

环球市场播报

06/02

　　韩国产业通商资源部在一份声明中表示，为助力本土蓬勃发展的芯片产业维系竞争力，韩国将简化半导体生产所用极紫外（EUV）光刻机的进口通关手续。根据内阁批准的修订版《高压气体安全控制法》实施细则，EUV 设备进口办理周期将从此前的34天缩短至约9天。韩国产业部表示，此项新政将利好三星电子与 SK 海力士，两家企业可更快完成高端芯片生产设备的装机投产。

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