台積電再次強調：現在沒必要使用阿斯麥的High-NA EUV光刻設備

芯財富

2025/05/28

晶圓代工龍頭台積電高層主管透露，公司仍在評估何時在未來的製程中，使用ASML的高數值孔徑極紫外光（High-NA EUV）光刻設備。當有人提問台積電是否計劃將High-NA EUV設備，用於即將推出的A14（1.4nm）製程及未來製程的升級時，台積電業務開發、全球業務資深副總經理暨副共同營運長張曉強表示，公司尚未找到令人信服的理由。張曉強表示：A14，我所說的加強提升，在不使用High-NA ...

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height: 30px; margin: 0; padding: 0; border-radius: 50%; float: left;}\n.head .h-content { margin: 0; padding: 0 0 0 9px; float: left;}\n.head .h-name {font-size: 13px; color: #eee; margin: 0;}\n.head .h-time {font-size: 12.5px; color: #7E829C; margin: 0;}\n.small {font-size: 12.5px; display: inline-block; transform: scale(0.9); -webkit-transform: scale(0.9); transform-origin: left; -webkit-transform-origin: left;}\n.smaller {font-size: 12.5px; display: inline-block; transform: scale(0.8); -webkit-transform: scale(0.8); transform-origin: left; -webkit-transform-origin: left;}\n.bt-text {font-size: 12px;margin: 1.5em 0 0 0}\n.bt-text p {margin: 0}\n</style>\n</head>\n<body>\n<div class=\"wrapper\">\n<header>\n<h2 class=\"title\">\n台積電再次強調：現在沒必要使用阿斯麥的High-NA EUV光刻設備\n</h2>\n<h4 class=\"meta\">\n<p class=\"head\">\n<strong class=\"h-name small\">芯財富</strong><span class=\"h-time small\">2025-05-28 16:42</span>\n</p>\n</h4>\n</header>\n<article>\n<div>\n<p>晶圓代工龍頭台積電高層主管透露，公司仍在評估何時在未來的製程中，使用ASML的高數值孔徑極紫外光（High-NA EUV）光刻設備。當有人提問台積電是否計劃將High-NA EUV設備，用於即將推出的A14（1.4nm）製程及未來製程的升級時，台積電業務開發、全球業務資深副總經理暨副共同營運長張曉強表示，公司尚未找到令人信服的理由。張曉強表示：A14，我所說的加強提升，在不使用High-NA ...</p>\n\n<a href=\"http://gu.qq.com/resources/shy/news/detail-v2/index.html#/?id=nesSN20250528221723a6f07e17&s=b\">網頁鏈接</a>\n\n</div>\n\n<div class=\"bt-text\">\n\n\n<p> 來源：<a href=\"http://gu.qq.com/resources/shy/news/detail-v2/index.html#/?id=nesSN20250528221723a6f07e17&s=b\">芯財富</a></p>\n<p>為提升您的閱讀體驗，我們對本頁面進行了排版優化</p>\n\n\n</div>\n</article>\n</div>\n</body>\n</html>\n","isBrief":false,"type":0,"news_type":1,"symbol":"TSM","symbol_name":"台積電","start_time":0,"source_url":"http://gu.qq.com/resources/shy/news/detail-v2/index.html#/?id=nesSN20250528221723a6f07e17&s=b","article_id":"2538474739","we_media_id":null,"thumbnails":[],"rights":{"source":"tencent","url":"http://gu.qq.com/resources/shy/news/detail-v2/index.html#/?id=nesSN20250528221723a6f07e17&s=b","rn_cache_url":null,"customStyle":"body{padding-top:10px;}#news_title{font-weight:bold;#titleStyle#;}#news_description span{font-size:12px;#descriptionStyle#;}.footer-note{#statement#}","selectors":".mod-LoadTzbdNews, body","filters":".relate-stock, .hot-list, .recom-box, .wx-sou","directOrigin":true},"url":"https://stock-news.laohu8.com/highlight/detail?id=2538474739","pubTimestamp":1748421747,"columns":[],"sourceInfo":{"source_id":"tencent","name":"腾讯"},"weMediaInfo":null,"summary":"公司尚未找到令人信服的理由。","collect":0,"end_time":0,"defaultTopTitle":"qq.com","property":[],"viewcount":null,"language":"zh","relate_stocks":{"TSM":"台积电"},"translate_title":"TSMC emphasizes again: There is no need to use ASML's High-NA EUV lithography equipment now","themeId":"","isJumpTheme":false,"ttsUrl":null,"symbols_score_info":{"TSM":1},"content_text":"晶圓代工龍頭台積電高層主管透露，公司仍在評估何時在未來的製程中，使用ASML的高數值孔徑極紫外光（High-NA EUV）光刻設備。當有人提問台積電是否計劃將High-NA EUV設備，用於即將推出的A14（1.4nm）製程及未來製程的升級時，台積電業務開發、全球業務資深副總經理暨副共同營運長張曉強表示，公司尚未找到令人信服的理由。張曉強表示：A14，我所説的加強提升，在不使用High-NA EUV的情況下也非常顯著。因此，技術團隊繼續尋找一種方法，利用規模效益來延長當前（低數值孔徑光刻設備）的壽命。只要他們能繼續找到方法，顯然我們就不必使用它（High-NA EUV）。由於High-NA EUV造價超過4億美元，幾乎比目前晶圓廠中最昂貴設備的價格翻倍，因此芯片製造廠商們正在權衡，昂貴的High-NA EUV在速度和精確度方面帶來的效益，何時才能覆蓋高昂價格帶來的成本。英特爾已經計劃在未來的14A製程中使用High-NA EUV，便加強與台積電競爭。不過，英特爾也説，客户仍選擇採用較舊且穩定的技術。ASML上周透露，全球目前僅五台High-NA EUV正式出貨，客户包括英特爾、台積電和三星。Christophe Fouquet在最近一次財報會議上表示，他預期客户準備好為2026-2027年量產測試High-NA EUV。張曉強去年表示，台積電不會在A16製程中使用High-NA EUV，不喜歡該設備的價格。","kind":"news","is_publish_news":true,"is_publish_highlight":false,"is_publish_live":false,"is_publish_wemedia":null,"editions":null,"column":"","sentiment":"0","news_tag":"","news_rank":0,"symbols":[],"gpt_button":0,"need_auth":false,"code":"91000000","status":"200"}}}