適用於先進封裝無掩膜光刻，德州儀器推出 DLP991UUV 工業數字微鏡

IT之家

2025/10/04

IT之家 10 月 4 日消息，德州儀器 TI 美國當地時間 9 月 30 日推出了新款紫外波段工業數字微鏡器件 DLP991UUV。其不僅可用於 3D 打印場景，還能在半導體制造過程中發揮獨特作用。DLP991UUV 是一款可調製入射光幅度、方向和 / 或相位的空間光調製器 (SLM)，擁有 4096×2176 透鏡陣列，微鏡間距 5.4µm、對角線長度 0.99 英寸，設計用於控制波長 343...

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透鏡陣列，微鏡間距 5.4µm、對角線長度 0.99 英寸，設計用於控制波長 343~410nm 的紫外光。這一數字微鏡可用於直接成像光刻系統，無需通過掩膜就能將電路圖案直寫到材料上，擁有亞微米級的圖案化精度，適合對分辨率要求較低但對成本敏感的先進封裝領域。此外無掩膜的特質也意味着其能根據材料表面實際狀態實時調整圖案而無需更換掩膜耗材，加快工藝調優的同時也降低了成本。廣告聲明：文內含有的對外跳轉鏈接（包括不限於超鏈接、二維碼、口令等形式），用於傳遞更多信息，節省甄選時間，結果僅供參考，IT之家所有文章均包含本聲明。","kind":"news","is_publish_news":true,"is_publish_highlight":false,"is_publish_live":false,"is_publish_wemedia":null,"editions":null,"column":"","sentiment":"1","news_tag":"productRelease","news_rank":0,"symbols":[],"gpt_button":1,"need_auth":false,"code":"91000000","status":"200"}}}