SK Hynix Introduces ASML's High NA EUV Mass-Production Equipment
MT Newswires Live
Sep 03
SK Hynix (KRX:000660) introduced ASML's high numerical aperture extreme ultraviolet (high-NA EUV) lithography mass-production equipment, installing the TwinScan EXE:5200B at its Icheon M16 fab.
The newly introduced equipment, ASML's TwinScan EXE:5200B, is from the Netherlands.
The system, with a 0.55 numerical aperture, offers 1.7 times finer circuit precision and 2.9 times higher integration than conventional EUV, making way for improved and economic DRAM, the chipmaker said in a Wednesday press release.
Shares of SK Hynix rose nearly 2% in recent trade.
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