联电推出55nm BCD特色工艺平台,包含非外延、外延、SOI制程

IT之家
Oct 22

IT之家 10 月 22 日消息,中国台湾地区晶圆代工企业联华电子(IT之家注:即联电、UMC)今日宣布推出55nm BCD (Bipolar-CMOS-DMOS)工艺平台。

这一特色制程能在单一芯片上集成模拟、数字与电力元件,广泛应用于电源管理与混合信号集成电路,可提升移动设备、消费电子、汽车工业应用产品的能效表现,并提供更小芯片面积与卓越抗噪声表现。

联电的55nm BCD平台包含非外延 / 磊晶(Non-EPI)、外延 / 磊晶(EPI)、绝缘层上硅(SOI)三类制程,同时整合了UTM超厚金属层、eFLASH嵌入式闪存、RRAM忆阻器等技术。

联电技术研发副总经理徐世杰表示:

55纳米BCD平台的推出,象征联电在BCD技术布局上的重要里程碑,更进一步完善我们的特殊制程产品组合,强化在电源管理市场的竞争优势。

虽然55纳米BCD制程已在市场上量产多年,联电推出全新且全面的55纳米BCD解决方案,具备卓越的组件特性,协助客户打造创新电源解决方案,应用范围涵盖智能手机、穿戴式装置、车用、智能家庭与智慧工厂等领域。

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