ASML遭遇最强挑战!这项光刻技术更适合AI时代?

21ic电子网
Nov 05, 2025

在半导体制造的技术版图中,光刻工艺无疑是最为核心的关键阶段之一。它不仅直接决定了芯片的最小特征尺寸,更对整个制造过程的复杂度与成本结构产生着深远影响。过去十年间,ASML的极紫外(EUV)光刻系统已然成为先进制造进程的标志性象征,其13.5nm波长的光源,有力支撑了台积电、三星、英特尔等巨头在3nm及以下先进制程领域的探索与发展。然而,EUV并非尽善尽美的技术方案,它功能强大但成本高昂,设备价格...

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