ASML称High NA EUV更省时间与成本

芯智讯
Nov 21

光刻机大厂ASML于11月19日在中国台湾举行媒体会,ASML中国台湾暨东南亚区客户营销主管徐宽成指出,随着半导体制程技术持续不断微缩,High NA EUV光刻机将有助于客户节省时间及成本,目前客户已有英特尔、IBM 及三星等,累积超过35万片晶圆使用High NA EUV光刻机曝光。徐宽成说,当今社会正从芯片无所不在,转变成人工智能(AI)无所不在。AI将驱动半导体先进及成熟制程需求成长,预期...

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