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CVD设备

5.81
-0.3300-5.37%
盘后5.810.00000.00%19:16 EDT
成交量:16.27万
成交额:99.35万
市值:4,030.59万
市盈率:-10.96
高:6.35
开:6.25
低:5.68
收:6.14
52周最高:8.46
52周最低:2.75
股本:693.73万
流通股本:481.10万
量比:0.60
换手率:3.38%
股息:- -
股息率:- -
每股收益(TTM):-0.5300
每股收益(LYR):-0.2305
净资产收益率:-12.51%
总资产收益率:-7.13%
市净率:1.73
市盈率(LYR):-25.20

数据加载中...

公司资料

公司名字:
CVD设备
交易所:
NASDAQ
成立时间:
1982
员工人数:
85
公司地址:
355 South Technology Drive,Central Islip,New York,United States
邮编:
11722
电话:
传真:
- -
简介:
CVD Equipment Corporation于1982年10月13日在纽约注册成立。该公司为航空航天、半导体和电池储能等先进材料市场设计、开发和制造化学气相沉积、热处理设备及气体输送控制系统。它通过两个可报告部门运营:CVD设备和不锈钢设计概念,后者已达成最终协议待出售。

董事

名称
职位
Emmanuel Lakios
Chief Executive Officer and Director and President
Lawrence J. Waldman
Chairman of the Board and Director
Andrew Africk
Director
Ashraf Lotfi
Director
Debra Wasser
Director
Robert M. Brill
Director

股东

名称
职位
Emmanuel Lakios
Chief Executive Officer and Director and President
Richard Catalano
Chief Financial Officer and Executive Vice President and Secretary and Treasurer
Jeffrey A. Brogan
Vice President of Sales and Marketing
Kevin R. Collins
General Manager of SDC and Vice President
Max Shatalov
Vice President of Engineering and Technology
Warren D. Cheesman
Vice President of Manufacturing Operations