阿斯麦（ASML）美股盘前涨超2%，公司新一代EUV光刻机获得台积电和三星的使用承诺。
三星和台积电（TSMC）这两家全球最大的芯片制造商，已经承诺采用ASML 的 High NA 极紫外（EUV）光刻机。随着市场对更先进芯片的需求不断增长，这项技术的重要性也日益提升。
ASML 的 EUV 光刻机是芯片制造过程中至关重要的设备，用于将电路图案印刷到硅晶圆上。High NA 光刻机能够印刷尺寸更小、结构更加复杂精细的电路图案。这类设备的单台价格约为4亿美元。
作为全球最大的存储芯片制造商之一，三星表示，将从2028年开始使用 ASML 的 High NA EUV 光刻机生产 DRAM。DRAM 是一种关键的存储器类型。
三星表示，将在2030年采用这项技术，并称该技术将帮助其“延长 DRAM 的制程微缩路线图（scaling roadmap）”，同时提高生产工艺的效率。
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