普达特科技(00650)在半导体设备领域，继清洗设备之后，又一项半导体晶圆制造流程中的重要工艺项目CVD（化学气相沉积）设备业务按计划开展，初步向该业务投放人民币1.4亿元。按计划，CVD产品的范围包括用于制造12吋芯片的多种先进热CVD设备，预期CVD产品将于2024年进入商业生产阶段。这一工艺的设备目前在国内的国产替代率很低，全球CVD设备市场的技术壁垒高，具有广阔和巨大的市场潜力。薄膜沉积设备占半导体设备总市场份额的18%，于2021年的全球规模超过170亿美元，而CVD设备占薄膜沉积设备总市场份额的66%，于2021年的全球市场规模超过110亿美元。同时该项目在半导体沉积工艺上积累的先进技术能力，会给予太阳能设备研发强大的技术借鉴和提升，对公司太阳能业务保持和突破优势具有巨大意义。
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