三星被爆:为聚焦 ArF 和 EUV 等先进技术,将外包“光掩模”生产

C114通信网
May 14, 2025

韩国科技媒体 TheElec 今日报道称,三星电子正计划将内存芯片制造所需的光掩模生产业务进行外包。具体为:三星准备将低端产品(i-line 365 纳米、KrF 248 纳米)进行外包,内部仅保留高端光掩模(ArF 193 纳米、EUV 13.5 纳米),原 i-line / KrF 资源转向 ArF / EUV 研发。目前三星已启动供应商评估流程,候选企业包括日本 Toppan 控股子公司 ...

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