台积电再次强调:现在没必要使用阿斯麦的High-NA EUV光刻设备

芯财富
May 28, 2025

晶圆代工龙头台积电高层主管透露,公司仍在评估何时在未来的制程中,使用ASML的高数值孔径极紫外光(High-NA EUV)光刻设备。当有人提问台积电是否计划将High-NA EUV设备,用于即将推出的A14(1.4nm)制程及未来制程的升级时,台积电业务开发、全球业务资深副总经理暨副共同营运长张晓强表示,公司尚未找到令人信服的理由。张晓强表示:A14,我所说的加强提升,在不使用High-NA ...

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