本文由半导体产业纵横(ID:ICVIEWS)综合未来晶体管设计可能降低芯片制造对先进光刻设备的依赖。最近,英特尔高管发表了一个颇具争议的观点:未来晶体管设计(如GAAFET和CFET)可能降低芯片制造对先进光刻设备(尤其是EUV光刻机)的依赖。这一观点挑战了当前先进芯片制造的核心范式。目前,ASML的极紫外(EUV)光刻机是制造高端芯片(如7nm及以下节点)的关键设备,它负责帮助台积电等公司将极其...
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