光刻机巨头,研发下一代芯片设备!

天天IC
Jun 28, 2025

集微网·爱集微APP,各大主流应用商店均可下载据报道,荷兰半导体设备制造商ASML的技术执行副总裁Jos Benschop表示,该公司已开始致力于开发下一代尖端光刻机,以服务于未来十年的芯片行业。Benschop称,ASML及其独家光学合作伙伴卡尔蔡司正在研究能够单次曝光即可印制分辨率精细至5nm的设备,并补充说该技术将足够先进,可以满足2035年及以后的行业需求。最近,ASML已开始交付其最先进...

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