金融界2025年7月12日消息，国家知识产权局信息显示，ASML荷兰有限公司申请一项名为“用于夹持翘曲衬底的真空台和方法”的专利，公开号CN120303617A，申请日期为2023年11月。
专利摘要显示，本公开提供了一种真空台，包括：台，具有用于支撑衬底的顶表面，顶表面设置有至少两个压力区，每个压力区连接到相应的真空连接器以提供降低的压力，压力区中的至少一个设置有跨顶表面在径向方向上延伸的槽。相应的压力区可以包括连接到相应的真空连接器并沿所述顶表面延伸的相应的槽，每个压力区的槽至少沿顶表面沿圆形方向延伸。径向槽可以从相应的圆形槽像手指一样延伸。一个压力区的径向槽在另一压力区的径向槽之间延伸。
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