金融界2025年7月12日消息，国家知识产权局信息显示，ASML荷兰有限公司申请一项名为“超连续谱辐射源”的专利，公开号CN120303615A，申请日期为2023年11月。
专利摘要显示，披露了一种用于生成输出宽带辐射的宽带辐射源，包括串联布置的多个超连续谱生成级，每个所述超连续谱生成级包括相应的非线性生成元件。所述多个超连续谱生成级包括至少第一超连续谱生成级和第二超连续谱生成级，在所述串联中，所述第二超连续谱生成级在所述第一超连续谱生成级之后。被包括在所述第一超连续谱生成级内的第一非线性生成元件的损坏容许度大于被包括在所述第二超连续谱生成级内的至少第二非线性生成元件的损坏容许度。
Disclaimer: Investing carries risk. This is not financial advice. The above content should not be regarded as an offer, recommendation, or solicitation on acquiring or disposing of any financial products, any associated discussions, comments, or posts by author or other users should not be considered as such either. It is solely for general information purpose only, which does not consider your own investment objectives, financial situations or needs. TTM assumes no responsibility or warranty for the accuracy and completeness of the information, investors should do their own research and may seek professional advice before investing.