快科技7月17日消息，光刻机龙头ASML现在宣布，全球首台最强光刻机第二代High NA EUV已经出货。
按照官方的说法，EXE:5200是ASML对现有初代High NA EUV光刻机EXE:5000的改进版本，首台买家是英特尔，一台售价近30亿元。
相比初代High NA EUV光刻机EXE:5000来说，EXE:5200拥有更高的晶圆吞吐量（EXE:5000为每小时185片以上），可以更好的为2nm工艺量产做支撑。
TWINSCAN EXE:5000和EXE:5200均提供了0.55数值孔径，比前代EUV光刻机0.33数值孔径透镜的精度提高了，可以为更小的晶体管功能提供更高分辨率的模式。
EUV 0.55 NA的设计旨在从2025年开始实现多个未来节点，这是业内首次部署，随后将采用类似密度的内存技术。
需要注意的是，这种高精尖的光刻机，ASML是不可能卖给中国厂商的，这不是钱的问题，而是其他因素。
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