“它不是光刻机,但重要性仅次于光刻机。”“蚀刻技术将取代光刻成为芯片制造核心。”半导体市场的两则言论,直接将刻蚀设备的热潮推向高点。01光刻机,不再是唯一解上述言论中的后一句,来自英特尔的一位高管。目前,ASML的极紫外(EUV)光刻机是制造高端芯片(如7nm及以下节点)的关键设备。然而,该董事认为,像环绕栅极场效应晶体管(GAAFET)和互补场效应晶体管(CFET)这样的新型设计,将显著增加光刻...
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