美国投行给中国光刻机落后ASML 20年原因:缺乏制造先进光刻扫描仪能力

快科技
Sep 03

快科技9月3日消息,昨天美国知名的投行高盛给出观点称,中国先进芯片制造业落后西方技术20年。投资银行高盛认为,中国光刻机公司至少落后美国同行20年。光刻技术是半导体制造的几个环节之一,也是阻碍中国制造高端芯片的唯一瓶颈。最先进的光刻机由荷兰公司ASML制造,由于其依赖美国原产的零部件,美国政府有权限制其对华销售。在高盛看来,美国对中芯国际施加制裁,限制其采购极紫外 (EUV) 芯片制造光刻机,这...

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