据报道，日前，清华大学国家科技重大专项“极大规模集成电路制造装备及成套工艺”召开关于“光刻机双工件台系统样机研发”项目验收会。经过严格评议，专家组对项目给予了高度评价，一致同意该项目通过任务验收和财务验收，认为该项目关键技术达到国际水准。
业内认为，清华大学团队的磁悬浮双工件台技术为EUV光刻机提供了新路径。传统ASML（阿斯麦）路线依赖气浮导轨，而磁悬浮技术在精度、能耗等方面更具优势。若国产技术在EUV场景验证成功，可能引发光刻机技术路线的“范式转换”。
相关专家表示，清华大学双工件台技术的突破是中国半导体设备自主化的重要里程碑，但其产业化进程仍需在材料、工艺、产业链协同等方面持续突破。
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