格隆汇9月26日丨微导纳米(688147.SH)在互动平台表示，公司是国内领先的ALD设备供应商，相关产品涵盖了行业所需主流ALD薄膜材料及工艺。ALD技术在45nm以下节点以及3D结构等先进半导体薄膜沉积环节具有良好的应用前景，是半导体设备中增长最快的领域之一。公司开发的国内首台成功应用于集成电路制造前道生产线的量产型High-k ALD设备，解决了国内集成电路突破28nm制程节点最核心工艺之一的高介电常数(High-k)栅氧层薄膜工艺。公司持续拓展技术覆盖面，陆续研发和推出HKMG技术、柱状电容器、金属化薄膜沉积技术及高深宽比3D NAND、3DDRAM、TSV技术等工艺解决方案，覆盖逻辑芯片、存储芯片、先进封装、化合物半导体和新型显示(硅基OLED)中ALD技术的主要应用场景。 【免责声明】本文仅代表作者本人观点，与和讯网无关。和讯网站对文中陈述、观点判断保持中立，不对所包含内容的准确性、可靠性或完整性提供任何明示或暗示的保证。请读者仅作参考，并请自行承担全部责任。邮箱：news_center@staff.hexun.com
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