受极紫外(EUV)和深紫外(DUV)光刻设备强劲需求推动,阿斯麦或将在2030年实现440-600亿欧元的营收目标。按520亿欧元的中值计算,2025至2030年间年销售额增长率可达10%。面向1.4纳米、1.0纳米及亚1.0纳米芯片的新一代EUV设备订单预计将从2025或2026年开始快速增长,其售价可能较传统EUV设备高出50%-100%。
受极紫外(EUV)和深紫外(DUV)光刻设备强劲需求推动,阿斯麦或将在2030年实现440-600亿欧元的营收目标。按520亿欧元的中值计算,2025至2030年间年销售额增长率可达10%。面向1.4纳米、1.0纳米及亚1.0纳米芯片的新一代EUV设备订单预计将从2025或2026年开始快速增长,其售价可能较传统EUV设备高出50%-100%。
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