如果您希望可以时常见面,欢迎标星 收藏哦~来源:内容来自半导体芯闻综合。新的2纳米工艺仍可利用台积电现有的EUV(极紫外光刻)设备实现晶圆的大规模量产,并保持较高的良率。但随着这家台湾半导体巨头推进到更先进的次2纳米节点——即1.4纳米与1纳米(分别代号A14与A10)——制造工艺将面临更多技术瓶颈。理论上,这些问题可以通过采购ASML的最先进High-NA EUV设备来解决,但最新消息称,台积电...
Source Link如果您希望可以时常见面,欢迎标星 收藏哦~来源:内容来自半导体芯闻综合。新的2纳米工艺仍可利用台积电现有的EUV(极紫外光刻)设备实现晶圆的大规模量产,并保持较高的良率。但随着这家台湾半导体巨头推进到更先进的次2纳米节点——即1.4纳米与1纳米(分别代号A14与A10)——制造工艺将面临更多技术瓶颈。理论上,这些问题可以通过采购ASML的最先进High-NA EUV设备来解决,但最新消息称,台积电...
Source LinkDisclaimer: Investing carries risk. This is not financial advice. The above content should not be regarded as an offer, recommendation, or solicitation on acquiring or disposing of any financial products, any associated discussions, comments, or posts by author or other users should not be considered as such either. It is solely for general information purpose only, which does not consider your own investment objectives, financial situations or needs. TTM assumes no responsibility or warranty for the accuracy and completeness of the information, investors should do their own research and may seek professional advice before investing.