台积电弃购4亿ASML光刻机 转用低成本方案攻坚2纳米

爱集微
Oct 23

10月23日,据台湾媒体报道,全球领先的半导体制造商台积电在面对技术节点进一步微缩至1.4纳米(A14)及1纳米(A10)的新制造瓶颈时,做出了重大决策:放弃采购单价高达4亿美元的ASML高数值孔径(High-NA)EUV光刻机。理论上,采购荷兰ASML公司尖端的高数值孔径EUV光刻机是解决这一技术难题的直接方案。然而,最新报道指出,台积电并未选择这一路径,而是决定采用“光掩模护膜”技术作为替代...

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