大约每隔 6 个月,我们就会看到有关纳米压印光刻颠覆 EUV 的新一轮头条新闻。这听起来像是个不错的标题党,但事实并非如此。这项技术有很多有趣且有效的应用,但远不及EUV所能达到的程度。理论上,NIL可以匹敌甚至超越EUV。但实际上,NIL存在一些严重的问题,而且目前还没有明确的发展方向。在本文中,我们将从理论层面与晶圆厂实际操作层面解释这些差异。我们还将详细介绍市场中的关键参与者及其可能的应用...
Source Link大约每隔 6 个月,我们就会看到有关纳米压印光刻颠覆 EUV 的新一轮头条新闻。这听起来像是个不错的标题党,但事实并非如此。这项技术有很多有趣且有效的应用,但远不及EUV所能达到的程度。理论上,NIL可以匹敌甚至超越EUV。但实际上,NIL存在一些严重的问题,而且目前还没有明确的发展方向。在本文中,我们将从理论层面与晶圆厂实际操作层面解释这些差异。我们还将详细介绍市场中的关键参与者及其可能的应用...
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