在全球半导体产业争夺技术制高点的关键时刻,德国高科技企业TRUMPF与荷兰光刻巨头ASML宣布达成独家战略合作,成功开发出新一代EUV(极紫外)高能激光器。这一突破性技术已于2025年10月完成首次测试,计划于2026年投入量产,将为ASML下一代高数值孔径EUV光刻系统提供核心光源,推动全球芯片制造进入2纳米及以下工艺时代。技术革命:重新定义EUV光源的性能极限这款被誉为"芯片制造之光"的新一代...
Source Link在全球半导体产业争夺技术制高点的关键时刻,德国高科技企业TRUMPF与荷兰光刻巨头ASML宣布达成独家战略合作,成功开发出新一代EUV(极紫外)高能激光器。这一突破性技术已于2025年10月完成首次测试,计划于2026年投入量产,将为ASML下一代高数值孔径EUV光刻系统提供核心光源,推动全球芯片制造进入2纳米及以下工艺时代。技术革命:重新定义EUV光源的性能极限这款被誉为"芯片制造之光"的新一代...
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