台积电联手英伟达掀起光刻革命:反向光刻技术如何用AI破解2纳米芯片制造难题

半导体行业小报
Nov 13

在半导体制造领域,一场静悄悄的技术革命正在台积电和英伟达的实验室中酝酿。反向光刻技术(Inverse Lithography Technology, ILT)——这项曾经仅限于芯片"热点"区域修补的辅助技术,正在AI的赋能下升级为颠覆芯片制造范式的核心利器。随着台积电2纳米制程节点的临近,ILT技术以其独特的"逆向思维"方式,正在解决极紫外光刻(EUV)面临的根本性物理限制,为摩尔定律的延续开辟...

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