“台积电N2节点引入曲线性掩模Curvy Masks”光刻机离不开光掩模光刻技术利用光线将芯片设计图像从一种特殊的玻璃或反射镜模板,即光掩模(photomask),缩小并投影到晶圆上。曝光图像后进行显影,然后是刻蚀工艺,最终固化图案。光掩模本身是在称为掩模工厂的特殊设施中准备的。在这些工厂内,特殊的掩模写入机使用发射电子束的特殊工具,将芯片图案写入6英寸的掩模基板上。由于这些掩模将作为数百万芯片的...
Source Link“台积电N2节点引入曲线性掩模Curvy Masks”光刻机离不开光掩模光刻技术利用光线将芯片设计图像从一种特殊的玻璃或反射镜模板,即光掩模(photomask),缩小并投影到晶圆上。曝光图像后进行显影,然后是刻蚀工艺,最终固化图案。光掩模本身是在称为掩模工厂的特殊设施中准备的。在这些工厂内,特殊的掩模写入机使用发射电子束的特殊工具,将芯片图案写入6英寸的掩模基板上。由于这些掩模将作为数百万芯片的...
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