台积电前研发副总裁林本坚近日在接受媒体专访时提出一个引人关注的观点:中国大陆或许无需依赖EUV光刻机,仅凭现有的浸润式DUV光刻机技术,就有可能突破5纳米芯片制造工艺。这位被誉为“浸润式光刻机之父”的专家指出,浸润式DUV光刻机本身具备这样的技术潜力,其原理在于通过多重曝光等工艺优化手段,能够突破传统技术节点的限制。追溯浸润式光刻机的发展历程,林本坚在台积电任职期间主导了这项技术的研发。当时日本...
Source Link台积电前研发副总裁林本坚近日在接受媒体专访时提出一个引人关注的观点:中国大陆或许无需依赖EUV光刻机,仅凭现有的浸润式DUV光刻机技术,就有可能突破5纳米芯片制造工艺。这位被誉为“浸润式光刻机之父”的专家指出,浸润式DUV光刻机本身具备这样的技术潜力,其原理在于通过多重曝光等工艺优化手段,能够突破传统技术节点的限制。追溯浸润式光刻机的发展历程,林本坚在台积电任职期间主导了这项技术的研发。当时日本...
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