12月15日,阿斯麦(ASML)首席执行官克里斯托夫·富凯表示,公司为High-NA EUV(高数值孔径极紫外光刻机)所设计的光刻改进方案已得到验证,成像效果极佳,分辨率非常出色。目前公司正与客户合作,以全面完善该光刻系统的成熟度。报道称,阿斯麦将与客户密切配合,确保High-NA EUV在明年内实现停机时间降至最低的稳定运行。富凯预计,High-NA EUV将在2027至2028年间实现大规模量产。
美股频道更多独家策划、专家专栏,免费查阅>>
12月15日,阿斯麦(ASML)首席执行官克里斯托夫·富凯表示,公司为High-NA EUV(高数值孔径极紫外光刻机)所设计的光刻改进方案已得到验证,成像效果极佳,分辨率非常出色。目前公司正与客户合作,以全面完善该光刻系统的成熟度。报道称,阿斯麦将与客户密切配合,确保High-NA EUV在明年内实现停机时间降至最低的稳定运行。富凯预计,High-NA EUV将在2027至2028年间实现大规模量产。
美股频道更多独家策划、专家专栏,免费查阅>>
Disclaimer: Investing carries risk. This is not financial advice. The above content should not be regarded as an offer, recommendation, or solicitation on acquiring or disposing of any financial products, any associated discussions, comments, or posts by author or other users should not be considered as such either. It is solely for general information purpose only, which does not consider your own investment objectives, financial situations or needs. TTM assumes no responsibility or warranty for the accuracy and completeness of the information, investors should do their own research and may seek professional advice before investing.