英特尔正在加快重返先进制程领导地位的节奏。最新消息显示,公司已经在美国俄勒冈州的D1X工厂启动了1.4纳米级“14A”工艺的初步试运行。这也是业内首次把 ASML的下一代 High NA EUV(高数值孔径极紫外光刻机)真正导入到商业生产线,被外界视为英特尔冲刺2027年量产目标的重要一步。从技术层面来看,14A相比现有的18A工艺,预计每瓦性能可以提升约15%。这次升级的核心在于两项关键技术:...
Source Link英特尔正在加快重返先进制程领导地位的节奏。最新消息显示,公司已经在美国俄勒冈州的D1X工厂启动了1.4纳米级“14A”工艺的初步试运行。这也是业内首次把 ASML的下一代 High NA EUV(高数值孔径极紫外光刻机)真正导入到商业生产线,被外界视为英特尔冲刺2027年量产目标的重要一步。从技术层面来看,14A相比现有的18A工艺,预计每瓦性能可以提升约15%。这次升级的核心在于两项关键技术:...
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