ASML研究人员表示，他们已找到一种方法来增强关键芯片制造设备光源的功率，到本十年末可使芯片产量提高最多50%，以帮助这家荷兰公司在与崛起的美中对手的竞争中保持领先。ASML负责EUV光源技术的首席技术专家Michael Purvis称，新系统能在完全符合客户现场所有要求的前提下稳定输出1000瓦功率，到本十年末，每台设备每小时可处理约330片晶圆，较目前的220片显著提升。 EUV光刻机对芯片生产至关重要，在美国，至少有两家初创公司——Substrate和xLight——已筹集数亿美元资金，致力于开发与ASML技术抗衡的美国产品，其中xLight获得了特朗普政府提供的资金支持。
Disclaimer: Investing carries risk. This is not financial advice. The above content should not be regarded as an offer, recommendation, or solicitation on acquiring or disposing of any financial products, any associated discussions, comments, or posts by author or other users should not be considered as such either. It is solely for general information purpose only, which does not consider your own investment objectives, financial situations or needs. TTM assumes no responsibility or warranty for the accuracy and completeness of the information, investors should do their own research and may seek professional advice before investing.