荷兰光刻设备制造商阿斯麦高管表示,公司新一代极紫外光刻机已准备就绪,芯片制造商可开始将其用于大规模生产。该设备单价约4亿美元,为初代EUV机型的两倍。阿斯麦首席技术官马尔科·皮特斯称,该设备已累计加工约50万片硅晶圆,停机时间极低,图案精度达到量产标准。
荷兰光刻设备制造商阿斯麦高管表示,公司新一代极紫外光刻机已准备就绪,芯片制造商可开始将其用于大规模生产。该设备单价约4亿美元,为初代EUV机型的两倍。阿斯麦首席技术官马尔科·皮特斯称,该设备已累计加工约50万片硅晶圆,停机时间极低,图案精度达到量产标准。
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