EUV光刻机大突破,技术全解密

与非网eefocus
Feb 26

全球微影设备龙头艾司摩尔(ASML)宣布,已找到方法强化芯片制造设备的光源功率,预计可在2030年底前让芯片产量提升最多五成,凸显尽管美国和中国都想改变ASML几近独占地位,它仍与竞争者保持极大技术差距,不仅其最大客户台积电是最大受益者,对于渴望取得更强大效率的AI两大关键芯片、AI加速器和高频宽记忆体(HBM)厂商而言也是好消息。ASML研究员发现方法,能将全球最先进的极紫外光(EUV)微影设备...

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