韩国产业通商资源部周二表示，政府将简化极紫外光刻（EUV）设备的进口程序。EUV是半导体制造的关键设备，此举旨在帮助韩国蓬勃发展的芯片产业保持其制造竞争力。

　　根据韩国内阁批准的《高压气体安全管理法》修订实施细则，EUV设备的进口时间预计从目前的34天缩短至约9天。

　　韩国产业通商资源部表示，此次修订将有助于三星电子和SK海力士等国内芯片制造商快速获得EUV设备，这对于建立先进的生产设施至关重要。

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