据快科技，俄罗斯绿城纳米技术中心（ZNTC）已成功研制出一台电子束光刻机（ELL）原型机，设计标准为150纳米。该项目属于俄罗斯国家计划科学技术发展框架下的重点研发任务，代号为Progress ELL 150。 这台设备主要用于制造光掩模，也可在不使用掩模的情况下直接在基板上绘制电路图案。150纳米制程大致对应20年前英特尔奔腾4的性能水平。2025年ZNTC曾展示过350纳米分辨率的同类设备，目前已向90纳米和130纳米技术节点推进。 行业专家指出，这种设备仅适合航天、国防等领域的专用芯片小批量生产。
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