三星电子计划在1nm级制程节点实现High NA EUV商业应用

格隆汇
Aug 12
据ZDNET Korea,三星电子计划在1nm级工艺制程节点实现High NA EUV设备的商业化应用。三星电子晶圆代工工艺开发团队朴昌民表示,对于2nm的SF2和1.4nm的SF1.4两个近期节点来说,High NA EUV光刻图案化技术仍不算成熟。而更高的图案化分辨率将在1nm级成为刚需,因此三星晶圆代工正以此为目标与合作伙伴联合研发。考虑到三星晶圆代工此前将2029年设定为SF1.4的量产时点并计划在2030年推出改进型SF1.4+,其1nm节点最快也要到2030年才会推出。

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