ChainCatcher 消息,黄仁勋在 All-In 峰会上判断,中国到 2030 年就能做出自己的先进光刻系统。他还认为,一旦技术成熟,中国有很强的大规模生产能力,国产设备进入本土晶圆厂只是时间问题。
该判断比蔡司更乐观。蔡司半导体负责人 Frank Rohmund 最近称,中国要做出国产 EUV 光刻机,可能还需要约 15 年。蔡司是 ASML EUV 光学系统的核心供应商。主持人问的是 advanced lithography systems,没有具体限定为 EUV,黄仁勋在回答中也没有进一步说是 EUV。
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